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Advanced Research Center for Nanolithography ARCNL
PhD-student (2): Laser-driven plasma sources of EUV light for nanolithography
Advanced Research Center for Nanolithography ARCNL
The Advanced Research Center for Nanolithography is a new type of public-private partnership between the University of Amsterdam, the VU University Amsterdam, the Netherlands Organisation for Scientific Research (NWO), and ASML.
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JOB DETAILS
Published: 25 days ago
Application deadline: Unspecified
Location: Amsterdam, Netherlands
Please mention that you found this job on Academic Positions when applying.
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PhD-student (2): Laser-driven plasma sources of EUV light for nanolithography

These two PhD projects are a part of the ERC Starting grant EUVPLASMA.

These PhD projects aim at understanding and controlling dense laser-produced plasma, to produce extreme ultraviolet (EUV) light for tomorrow’s nanolithography. In a team effort, we will answer the following questions: Which physical processes determine the efficiency of the conversion of drive laser energy into EUV power and what is its fundamental limit? How can we control the expansion dynamics of this plasma and prevent the plasma from inflicting damage to its surroundings? Answering these questions by focusing on the fundamentals of atomic plasma processes will pave the way for more powerful plasma sources of EUV light and enable the continuation of Moore’s law, producing ever more powerful chips. You will be embedded in the EUV Plasma Processes team at ARCNL, which frequently interacts with our industrial partner ASML.

About the group

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Netherlands Organisation for Scientific Research (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Science Park Amsterdam, The Netherlands, and is currently building up towards a size of approximately 100 scientists and support staff. See also www.arcnl.nl

The research activities of the EUV Plasma Processes group aim at the understanding of the basic dynamics on an atomic and molecular level of the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography.

Qualifications

Qualifications You have an MSc in (applied) physics. Knowledge in the fields of atomic and plasma physics, or laser physics is advantageous. Good verbal and written communication skills (in English) are required.

Terms of employment

The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of four years. After successful completion of the PhD research a PhD degree will be granted at the Vrije Universiteit Amsterdam (VU). Several courses are offered, specially developed for PhD-students. ARCNL assists any new foreign PhD-student with visa applications and compensates their transport costs and furnishing expense

Contact info

Dr. Oscar Versolato
Group leader Atomic Plasma Processes
E-mail: versolato@arcnl.nl
Phone: +31 (0)20-851 7100

Please send your:
- Resume;
- Motivation on why you want to join the group (max. 1 page).
Applications without this motivation will not be taken into consideration. However, with this motivation your application will receive our full attention.

Online screening may be part of the selection.

Commercial response to this ad is not appreciated.

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