The high-harmonic generation and EUV science groups develops and utilizes new high-harmonic generation based EUV and soft x-ray sources in the energy range from 10 – 600 eV for spectroscopy and metrology applications. Specific areas of interest are attosecond and femtosecond time-resolved spectroscopy of complex chemical and solid-state dynamics, new strategies for efficient high-harmonic generation, as well as new routes for nanometer-scale imaging of semiconductor structures. Novel types of attosecond and femtosecond transient absorption and reflection spectroscopies, as well as scattering techniques, will be developed, and applied to fundamental questions with particular relevance to nanolithography. The official start date of the group is 1 May 2018. Our new group is equipped with a Ti:Sa (Titanium:Sapphire) laser for high-harmonic generation. In addition, a unique, world-class 2 ïm, 50 kHz, multi-mJ optical parametric amplifier system (OPCPA) is under construction and expected to be available by the beginning of 2019. Both PhD projects will make use of the Ti:Sa as well as OPCPA laser system, and develop dedicated HHG targets driven by both sources. The group houses state-of-the-art lab facilities at the Advanced Research Center for Nanolithography (ARCNL). We offer a dynamic and open environment, and provide the optimum conditions for young scientists, such as high level technical support dedicated to our group. This will enable you to do exciting research, and to work on physics challenges with interesting fundamental aspects, but which may also have direct technological relevance.
The High-harmonic generation and EUV science group at ARCNL has two job openings for PhD students to perform cutting-edge scientific research in a state-of-the-art laboratory.
If you work on the first project, you will collaborate on efforts to investigate ultrafast photochemical dynamics with relevance to nanolithography. The dynamics of complex molecules such as photoresists as well as model systems, which mimic the reactivity of the complex photoresists, will be unraveled by time-resolved attosecond and femtosecond extreme-ultraviolet transient absorption and reflection pump-probe spectroscopy. You will develop novel instrumentation, and participate in experimental and theoretical collaborations.
If you work on the second project, you will develop new routes for the efficient generation of coherent extreme ultraviolet radiation by high-harmonic generation (HHG), and apply the HHG radiation to semiconductor metrology. New targets for high-harmonic generation, such as nanostructured solid-state samples, will be investigated. Semiconductor metrology will be performed by scattering XUV light from nanostructured samples, and by generating HHG in nanostructured samples. These experiments will benchmark the critical dimensions of semiconductor nanostructures.
The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Netherlands Organization for Scientific Research (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Amsterdam Science Park, the Netherlands, and is currently building up towards a size of approximately 100 scientists and support staff. More information on ARCNL: http://www.arcnl.nl/
You have (or will receive in the near future) a master's degree in physics, physical chemistry, electrical engineering, or a closely related subject. Experience with any of the involved topics (high-harmonic generation, ultrafast lasers and optics, vacuum instrumentation, attosecond and femtosecond science, EUV and X-Ray spectroscopy and scattering) is advantageous, but not mandatory.
Good verbal and written communications skills (in English) are required.
Conditions of employment
When fulfilling a PhD position at NWO-I, you will get the status of junior scientist. You will have an employee status and can participate in all the employee benefits NWO-I offers. You will get a contract for four years. Your salary will be up to a maximum of 2,937 euro gross per month. The salary is supplemented with a holiday allowance of 8 percent and an end-of-year bonus of 8.33 percent. You are supposed to have a thesis finished at the end of your four year term with NWO-I. A training programme is part of the agreement. You and your supervisor will make up a plan for the additional education and supervising that you specifically need. This plan also defines which teaching activities you will be responsible (up to a maximum of ten percent of your time). The conditions of employment of NWO-I are laid down in the Collective Labour Agreement for Research Centres (Cao-Onderzoekinstellingen), more exclusive information is available at this website under Personeelsinformatie (in Dutch) or under Personnel (in English). General information about working at NWO-I can be found in the English part of this website under Personnel. The 'Sollicitatiecode' applies to this position.
Dr. Peter Kraus, Group leader High Harmonic Generation and EUV Science, +31 20 754 71 68.
Please go to the ARCNL website, choose this job ad and use the button 'Apply for this position' at the bottom of that advertisement.